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  4. Minimized Blurring in Stencil Lithography using a Compliant Membrane
 
conference paper

Minimized Blurring in Stencil Lithography using a Compliant Membrane

Sidler, K.  
•
Villanueva, G.  
•
Vazquez-Mena, O.  
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2009
15th International Conference on Solid-State Sensors, Actuators and Microsystems (Transducers)
15th International Conference on Solid-State Sensors, Actuators and Microsystems (Transducers)
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Type
conference paper
DOI
10.1109/SENSOR.2009.5285768
Author(s)
Sidler, K.  
Villanueva, G.  
Vazquez-Mena, O.  
Brugger, J.  
Date Issued

2009

Published in
15th International Conference on Solid-State Sensors, Actuators and Microsystems (Transducers)
Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
NEMS  
LMIS1  
Event nameEvent placeEvent date
15th International Conference on Solid-State Sensors, Actuators and Microsystems (Transducers)

Denver, USA

Available on Infoscience
March 10, 2009
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/35852
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