conference paper
Minimized Blurring in Stencil Lithography using a Compliant Membrane
2009
15th International Conference on Solid-State Sensors, Actuators and Microsystems (Transducers)
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Sidler, K., Villanueva, G., Vazquez-Mena, O., & Brugger, J. (2009). Minimized Blurring in Stencil Lithography using a Compliant Membrane. 15th International Conference on Solid-State Sensors, Actuators and Microsystems (Transducers). 15th International Conference on Solid-State Sensors, Actuators and Microsystems (Transducers), Denver, USA, 2009. https://doi.org/10.1109/SENSOR.2009.5285768
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Sidler_2009_Trans_Minimized Blurring.pdf
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