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  4. Vertical band-to-band tunneling based non-volatile memory with high-K gate stack and stable hysteresis characteristics up to 400K
 
conference paper

Vertical band-to-band tunneling based non-volatile memory with high-K gate stack and stable hysteresis characteristics up to 400K

Biswas, Arnab  
•
Tomar, Saurabh
•
Ionescu, Adrian M.  
2016
2016 74th Annual Device Research Conference (DRC)
2016 74th Annual Device Research Conference (DRC)
  • Details
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Type
conference paper
DOI
10.1109/DRC.2016.7548493
Web of Science ID

WOS:000389535400090

Author(s)
Biswas, Arnab  
Tomar, Saurabh
Ionescu, Adrian M.  
Date Issued

2016

Publisher

IEEE

Publisher place

New York

Published in
2016 74th Annual Device Research Conference (DRC)
Total of pages

2

Start page

1

End page

2

Editorial or Peer reviewed

NON-REVIEWED

Written at

EPFL

EPFL units
NANOLAB  
CMI  
Event nameEvent placeEvent date
2016 74th Annual Device Research Conference (DRC)

Newark, DE, USA

19-22 June 2016

Available on Infoscience
October 17, 2016
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/129763
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