Oxidation of carboxylic acids at boron-doped diamond electrodes for wastewater treatment
Thin boron-doped diamond films were prepd. by HF CVD (hot filament chem. vapor deposition technique) on conductive p-Si substrate (Si/diamond). The morphol. of these Si/diamond electrodes was investigated by SEM and Raman spectroscopy. The electrochem. behavior of the Si/diamond electrodes in 1 M H2SO4 and in 1 M H2SO4 + carboxylic acids was investigated by cyclic voltammetry. Finally, the electrochem. oxidn. of some simple carboxylic acids (acetic, formic, oxalic) was investigated by bulk electrolysis. These acids can be oxidized at Si/diamond anodes to CO2, in the potential region of water and/or the supporting electrolyte decompn., with high current efficiency. [on SciFinder (R)]
Cite this item
Gandini, D., Mahe, E., Michaud, P. A., Haenni, W., Perret, A., & Comninellis, C. (2000). Oxidation of carboxylic acids at boron-doped diamond electrodes for wastewater treatment. Journal of Applied Electrochemistry, 30(12), 1345–1350. https://doi.org/10.1023/A:1026526729357
Click Copy to copy the citation, or select the text manually.
WOS:000165788500003
2000
30
12
1345
1350
REVIEWED
EPFL