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  4. Oxidation of carboxylic acids at boron-doped diamond electrodes for wastewater treatment
 
research article

Oxidation of carboxylic acids at boron-doped diamond electrodes for wastewater treatment

Gandini, D.
•
Mahe, E.
•
Michaud, P. A.  
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2000
Journal of Applied Electrochemistry

Thin boron-doped diamond films were prepd. by HF CVD (hot filament chem. vapor deposition technique) on conductive p-Si substrate (Si/diamond). The morphol. of these Si/diamond electrodes was investigated by SEM and Raman spectroscopy. The electrochem. behavior of the Si/diamond electrodes in 1 M H2SO4 and in 1 M H2SO4 + carboxylic acids was investigated by cyclic voltammetry. Finally, the electrochem. oxidn. of some simple carboxylic acids (acetic, formic, oxalic) was investigated by bulk electrolysis. These acids can be oxidized at Si/diamond anodes to CO2, in the potential region of water and/or the supporting electrolyte decompn., with high current efficiency. [on SciFinder (R)]

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Type
research article
DOI
10.1023/A:1026526729357
Web of Science ID

WOS:000165788500003

Author(s)
Gandini, D.
Mahe, E.
Michaud, P. A.  
Haenni, W.
Perret, A.
Comninellis, Ch  
Date Issued

2000

Published in
Journal of Applied Electrochemistry
Volume

30

Issue

12

Start page

1345

End page

1350

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
GGEC  
Available on Infoscience
February 22, 2006
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/225361
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