Repository logo

Infoscience

  • English
  • French
Log In
Logo EPFL, École polytechnique fédérale de Lausanne

Infoscience

  • English
  • French
Log In
  1. Home
  2. Academic and Research Output
  3. Journal articles
  4. Local interface composition and extended defect density in ZnSe/GaAs(001) and ZnSe/In0.04Ga0.96As(001) heterojunctions
 
research article

Local interface composition and extended defect density in ZnSe/GaAs(001) and ZnSe/In0.04Ga0.96As(001) heterojunctions

Heun, S.
•
Paggel, J. J.
•
Sorba, L.
Show more
1997
Journal of Vacuum Science & Technology B

We have recently shown that in II-VI/III-V heterojunctions and related devices fabricated by molecular beam epitaxy, the II/VI flux ratio employed during the early stages of II-VI growth can be used to control the local interface composition and the band alignment. Here we demonstrate that the local interface composition in pseudomorphic, strained ZnSe/GaAs(001) heterostructures as well as lattice-matched ZnSe/In0.04Ga0.96As(001) heterostructures also have a dramatic effect on the nucleation of native stacking fault defects. Such extended defects have been associated with the early degradation of blue-green lasers. We found, in particular, that Se-rich interfaces consistently exhibited a density of Shockley stacking fault pairs below our detection limit and three to four orders of magnitude lower than those encountered at interfaces fabricated in Zn-rich conditions. (C) 1997 American Vacuum Society. [S0734-211X(97)09104-X].

  • Details
  • Metrics
Type
research article
DOI
10.1116/1.589451
Web of Science ID

WOS:A1997XT08800087

Author(s)
Heun, S.
Paggel, J. J.
Sorba, L.
Rubini, S.
Franciosi, A.
Bonard, J. M.
Ganiere, J. D.  
Date Issued

1997

Published in
Journal of Vacuum Science & Technology B
Volume

15

Issue

4

Start page

1279

End page

1285

Subjects

ZNSE-GAAS

•

DISLOCATION NUCLEATION

•

STRUCTURAL-PROPERTIES

•

STACKING-FAULTS

•

DEEP LEVELS

•

HETEROSTRUCTURES

•

EPITAXY

•

FILMS

Note

Univ minnesota,dept chem engn & mat sci,minneapolis,mn 55455. ecole polytech fed lausanne,inst micro & optoelect,dept phys,ch-1015 lausanne,switzerland. cnr,ist icmat,i-00016 rome,italy. univ trieste,dipartimento fis,i-34127 trieste,italy. Heun, S, LAB NAZL TASC INFM,AREA RIC,PADRICIANO 99,I-34012 TRIESTE,ITALY.

ISI Document Delivery No.: XT088

Cited Reference Count: 32

Cited References:

1994, P SOC PHOTO-OPT INS, V2346, P1

BATSTONE JL, 1992, PHILOS MAG A, V66, P609

BONANNI A, 1995, APPL PHYS LETT, V66, P1092

BONARD JM, 1996, THESIS ECOLE POLYTEC

BONARD JM, 1997, PHIL MAG LETT, V75, P219

BOURRETCOURCHESNE ED, 1996, APPL PHYS LETT, V68, P1675

BRATINA G, 1996, J CRYST GROWTH, V159, P703

BRATINA G, 1996, J VAC SCI TECHNOL A, V14, P3135

BRATINA G, 1996, J VAC SCI TECHNOL B, V14, P2967

BREEN KR, 1989, J VAC SCI TECHNOL B, V7, P758

GAINES JM, 1993, J APPL PHYS, V73, P2835

GUHA S, 1993, APPL PHYS LETT, V63, P3023

GUHA S, 1993, APPL PHYS LETT, V63, P3107

GUHA S, 1993, J APPL PHYS, V73, P2294

HEUN S, 1996, J VAC SCI TECHNOL B, V14, P2980

HEUN S, 1997, APPL PHYS LETT, V70, P237

KUO LH, 1993, APPL PHYS LETT, V63, P3197

KUO LH, 1994, P SOC PHOTO-OPT INS, V2228, P144

KUO LH, 1994, PHILOS MAG A, V69, P301

KUO LH, 1996, APPL PHYS LETT, V68, P2413

KUO LH, 1996, APPL PHYS LETT, V69, P1408

LI D, 1990, APPL PHYS LETT, V57, P449

LI D, 1994, PHYS REV B, V49, P13643

NICOLINI R, 1994, PHYS REV LETT, V72, P294

PELLEGRINI V, 1996, APPL PHYS LETT, V69, P3233

PETRUZZELLO J, 1988, J APPL PHYS, V63, P2299

RAISANEN A, 1995, J ELECTRON MATER, V24, P163

RAISANEN A, 1995, J VAC SCI TECHNOL A, V13, P690

RAISANEN AD, 1995, APPL PHYS LETT, V66, P3301

TAKATANI S, 1992, PHYS REV B, V45, P8498

TANIMURA J, 1995, J APPL PHYS, V77, P6223

THOMAS G, 1979, TRANSMISSION ELECTRO

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LOEQ  
Available on Infoscience
August 31, 2007
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/11243
Logo EPFL, École polytechnique fédérale de Lausanne
  • Contact
  • infoscience@epfl.ch

  • Follow us on Facebook
  • Follow us on Instagram
  • Follow us on LinkedIn
  • Follow us on X
  • Follow us on Youtube
AccessibilityLegal noticePrivacy policyCookie settingsEnd User AgreementGet helpFeedback

Infoscience is a service managed and provided by the Library and IT Services of EPFL. © EPFL, tous droits réservés