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  4. High Tunning Range AISi RF MEMS Capacitors Fabricated with Sacrificial Amorphous Silicon Surface Micromachining
 
conference paper

High Tunning Range AISi RF MEMS Capacitors Fabricated with Sacrificial Amorphous Silicon Surface Micromachining

Fritschi, R.  
•
Frédérico, S.
•
Hibert, C.  
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2003
Microelectronic Engineering
Micro and Nano Engineering 2003 (MNE 2003)
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