conference paper
High Tunning Range AISi RF MEMS Capacitors Fabricated with Sacrificial Amorphous Silicon Surface Micromachining
2003
Microelectronic Engineering
Type
conference paper
Web of Science ID
WOS:000222145400079
Author(s)
Frédérico, S.
Flückiger, Ph.
Tsamados, D.
Boussey, J.
Chovet, A.
Udrea, F.
Curty, J.-P.
Date Issued
2003
Published in
Microelectronic Engineering
Volume
73–74
Start page
447
End page
451
Editorial or Peer reviewed
NON-REVIEWED
Written at
EPFL
EPFL units
| Event name | Event place | Event date |
Cambridge, UK | 22-25 September 2003 | |
Available on Infoscience
October 10, 2007
Use this identifier to reference this record