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  4. Nanomechanical structures with 91 MHz resonance frequency fabricated by local deposition and dry etching
 
research article

Nanomechanical structures with 91 MHz resonance frequency fabricated by local deposition and dry etching

Kim, GM  
•
Kawai, S
•
Nagashio, M
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2004
Journal of Vacuum Science and Technology B

We report an all-dry, two-step, surface nanoengineering method to fabricate nanomechanical elements without photolithography. It is based on the local deposition through a nanostencil of a well-defined aluminum pattern onto a silicon/silicon-nitride substrate, followed by plasma etching to release the structures. The suspended 100-nm-wide, 2-mum-long, and 300-nm-thick nanolevers and nanobridges have natural resonance frequencies of 50 and 91 MHz, respectively. The fabrication method is scalable to a full wafer and allows for a variety of materials to be structured on arbitrary surfaces, thus opening new types of nanoscale mechanical systems.

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Type
research article
DOI
10.1116/1.1761240
Web of Science ID

WOS:000223925300007

Author(s)
Kim, GM  
Kawai, S
Nagashio, M
Kawakatsu, H
Brugger, J  
Date Issued

2004

Published in
Journal of Vacuum Science and Technology B
Volume

22

Issue

4

Start page

1658

End page

1661

Subjects

atomic-force microscopy

•

lithography

•

mask

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LMIS1  
Available on Infoscience
November 2, 2005
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/218570
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