InGaN laser diodes emitting at 500 nm with p-layers grown by molecular beam epitaxy
We demonstrate hybrid laser diodes by combining n-type layers and an active region grown by metal organic vapor phase epitaxy with p-type layers grown by molecular beam epitaxy. These p-doped layers, grown at 740 degrees C, exhibit state-of-the-art electrical characteristics and prevent the indium-rich quantum wells from thermal degradation. Narrow ridge-waveguide lasers with high-reflectivity coatings show a threshold current density of 9.7 kA.cm(-2), a threshold voltage of 5.4V, and a lasing wavelength of 501 nm. The internal optical loss and material gain of the epitaxial structures are also measured and discussed. (C) 2015 The Japan Society of Applied Physics.
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Malinverni, M., Lamy, J.-M., Martin, D., Lahourcade, L., Feltin, E., Dorsaz, J., Castiglia, A., Rossetti, M., Duelk, M., Velez, C., & Grandjean, N. (2015). InGaN laser diodes emitting at 500 nm with p-layers grown by molecular beam epitaxy. Applied Physics Express, 8(2), Article 022105. https://doi.org/10.7567/Apex.8.022105
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WOS:000350091400014
2015
8
2
022105
REVIEWED
EPFL