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research article

InGaN laser diodes emitting at 500 nm with p-layers grown by molecular beam epitaxy

Malinverni, Marco  
•
Lamy, Jean-Michel  
•
Martin, Denis
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2015
Applied Physics Express

We demonstrate hybrid laser diodes by combining n-type layers and an active region grown by metal organic vapor phase epitaxy with p-type layers grown by molecular beam epitaxy. These p-doped layers, grown at 740 degrees C, exhibit state-of-the-art electrical characteristics and prevent the indium-rich quantum wells from thermal degradation. Narrow ridge-waveguide lasers with high-reflectivity coatings show a threshold current density of 9.7 kA.cm(-2), a threshold voltage of 5.4V, and a lasing wavelength of 501 nm. The internal optical loss and material gain of the epitaxial structures are also measured and discussed. (C) 2015 The Japan Society of Applied Physics.

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Type
research article
DOI
10.7567/Apex.8.022105
Web of Science ID

WOS:000350091400014

Author(s)
Malinverni, Marco  
Lamy, Jean-Michel  
Martin, Denis
Lahourcade, Lise  
Feltin, Eric
Dorsaz, Julien  
Castiglia, Antonino  
Rossetti, Marco
Duelk, Marcus
Velez, Christian
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Date Issued

2015

Publisher

Japan Society of Applied Physics

Published in
Applied Physics Express
Volume

8

Issue

2

Article Number

022105

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LASPE  
Available on Infoscience
April 13, 2015
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/113245
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