Minimized Blurring in Stencil Lithography using a Compliant Membrane
2009
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Details
Title
Minimized Blurring in Stencil Lithography using a Compliant Membrane
Author(s)
Sidler, K. ; Villanueva, G. ; Vazquez-Mena, O. ; Brugger, J.
Conference
The 15th International Conference on Solid-State Sensors, Actuators and Microsystems (Transducers 2009), Denver, Colorado, USA, June 21-25 2009
Date
2009
Record Appears in
Scientific production and competences > STI - School of Engineering > IGM - Institute of Mechanical Engineering > NEMS - Advanced Nano-electromechanical Systems Laboratory
Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > LMIS1 - Microsystems Laboratory 1
Presentations & Talks
Work produced at EPFL
Published
Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > LMIS1 - Microsystems Laboratory 1
Presentations & Talks
Work produced at EPFL
Published
Record creation date
2009-03-02