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  4. Polarization Screening in Multiferroic (Ga,Mn)As/P(VDF-TrFE) Transistors
 
research article

Polarization Screening in Multiferroic (Ga,Mn)As/P(VDF-TrFE) Transistors

Mikheev, E.
•
Riester, S. W. E.
•
Stolichnov, I.  
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2011
Ferroelectrics

Ferroelectric copolymers of polyvinylidene fluoride and trifluoroethylene are attractive gate materials because of a rather high remanent polarization, low dielectric permittivity, and easy integration on semiconductors due to the low processing temperature. Recently it was demonstrated that the functionalities of devices with ferroelectric polymer gates can be extended to magnetic field effect transistors with diluted magnetic semiconductor channels. Here we address the critical issue of polarization screening in such transistors quantifying the amount of polarization charge which controls the magnetic channel. The gate effect is shown to be limited by internal polarization screening rather than polarization retention loss.

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Type
research article
DOI
10.1080/00150193.2011.594738
Web of Science ID

WOS:000298543400017

Author(s)
Mikheev, E.
Riester, S. W. E.
Stolichnov, I.  
Setter, N.  
Date Issued

2011

Published in
Ferroelectrics
Volume

421

Start page

98

End page

102

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LC  
Available on Infoscience
June 12, 2012
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/81613
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