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research article

In situ photoelectron spectroscopy of titanium-containing amorphous hydrogenated carbon films

Schueler, Andreas  
•
Gampp, Ronald
•
Oelhafen, Peter
1999
Physical Review B

Titanium-containing amorphous hydrogenated carbon films (a-C:H/Ti) have been deposited by a medium-frequency-driven physical vapor deposition plasma-enhanced chemical-vapor deposition process at 40 kHz. Core-level photoelectron spectroscopy and valence-band photoelectron spectroscopy have served as means for the characterization of these films. The spectroscopic data are interpreted by a structural model on the basis of a nanocomposite containing titanium carbide clusters embedded in an amorphous hydrogenated carbon matrix. Within this model parallel energy shifts in the measured positions of the Ti 2p core levels and of the Fermi edge can be explained by a one-electron charging effect of nanometer-sized TiC clusters due to the photoemission process.

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Type
research article
DOI
10.1103/PhysRevB.60.16164
Author(s)
Schueler, Andreas  
Gampp, Ronald
Oelhafen, Peter
Date Issued

1999

Publisher

American Physical Society

Published in
Physical Review B
Volume

60

Issue

23

Start page

16164

End page

16169

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LESO-PB  
Available on Infoscience
May 23, 2012
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/80697
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