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research article

Exploiting Substrate Stress To Modify Nanoscale SAM Patterns

Singh, Chetana
•
Jackson, Alicia M.
•
Stellacci, Francesco  
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2009
Journal of the American Chemical Society

We describe a simple method based on postadsorption substrate stress induction to modify and control nanoscale phase-separated patterns formed in self-assembled monolayers. We show using mesoscale computer simulations and experiments that this method helps quickly progress a kinetically arrested patchy pattern into the equilibrium striped pattern, which is otherwise difficult to access. This work also establishes the role of curvature in the formation of aligned stripes several molecules wide on spherical nanoparticles and nanocylinders.

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Type
research article
DOI
10.1021/ja9063876
Author(s)
Singh, Chetana
Jackson, Alicia M.
Stellacci, Francesco  
Glotzer, Sharon C.
Date Issued

2009

Published in
Journal of the American Chemical Society
Volume

131

Issue

45

Start page

16377

End page

16379

Subjects

SELF-ASSEMBLED MONOLAYERS

•

PROTECTED METAL NANOPARTICLES

•

PHASE-SEPARATION

•

GOLD

•

BEHAVIOR

•

DOMAINS

Editorial or Peer reviewed

REVIEWED

Written at

OTHER

EPFL units
SUNMIL  
Available on Infoscience
June 6, 2011
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/68439
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