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research article
The influence of water vapor on the selective low pressure CVD of copper
Low pressure CVD of Cu from its bis-hexafluoroacetylacetonate was studied on oxidized Si substrates locally seeded with a 2.5 .ANG. Pt prenucleation film.
Type
research article
Authors
Publication date
1991
Published in
Volume
2
Issue
C2
Start page
C2
End page
279
Note
Copyright 2003 ACS
CAPLUS
AN 1992:73396
CAN 116:73396
76-2
Electric Phenomena
75
Lab. Chim. Tech.,Ec. Polytech. Fed. Lausanne,Lausanne,Switz. FIELD URL:
Journal
JPICEI
written in English.
Vapor deposition processes (organometallic, of copper, effect of water vapor on)
Peer reviewed
REVIEWED
EPFL units
Available on Infoscience
February 1, 2011
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