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  4. Reversed processing of dry photoresist: application to the encapsulation of chemical sensors
 
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conference paper

Reversed processing of dry photoresist: application to the encapsulation of chemical sensors

Courbat, Jérôme  
•
Briand, Danick  
•
de Rooij, Nico  
2010
Procedia Engineering
Eurosensors XXIV

A generic method for the reverse processing of dry photoresist is proposed. The technique is based on the lamination of pre-patterned polymeric structures on the pre-existing devices. The concept is illustrated with the encapsulation at the foil level of gas sensors made on plastic foil. This polymeric-based technique can be either applied on plastic foils but also on conventional substrates such as silicon or glass. It can be used when standard packaging techniques might not be suitable or when they can represent a significant cost. Using the lamination of a foil, the low-temperature and dry process presented here is compatible with large scale fabrication techniques, such as roll-to-roll processing, and aims at reducing the global fabrication cost of sensing devices made on plastic foil. (C) 2009 Published by Elsevier Ltd.

  • Details
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Type
conference paper
DOI
10.1016/j.proeng.2010.09.116
Web of Science ID

WOS:000287162400084

Author(s)
Courbat, Jérôme  
•
Briand, Danick  
•
de Rooij, Nico  
Date Issued

2010

Publisher

Elsevier Science, Reg Sales Off, Customer Support Dept, 655 Ave Of The Americas, New York, Ny 10010 Usa

Journal
Procedia Engineering
Volume

5

Start page

335

End page

338

Subjects

Foil level packaging

•

Encapsulation

•

Chemical sensor

•

Dry film photoresist

•

PerMX 3000

•

Reversed processing

•

Chemical sensor

•

Film Resist

Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
SAMLAB  
Event nameEvent placeEvent date
Eurosensors XXIV

Linz, Austria

September 5-8, 2010

Available on Infoscience
November 3, 2010
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/56585
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