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  4. Fabrication of Nanochannels Using Photolithography and Partial Etching of Sacrificial Layer
 
conference paper

Fabrication of Nanochannels Using Photolithography and Partial Etching of Sacrificial Layer

Han, A.
•
Mondin, G.
•
Hegelbach, N. G.
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2004
Micro Total Analysis Systems TAS 2004
  • Details
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Type
conference paper
Author(s)
Han, A.
Mondin, G.
Hegelbach, N. G.
de Rooij, N. F.  
Staufer, U.
Date Issued

2004

Published in
Micro Total Analysis Systems TAS 2004
Start page

309

End page

311

Editorial or Peer reviewed

NON-REVIEWED

Written at

OTHER

EPFL units
SAMLAB  
Available on Infoscience
May 12, 2009
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/39375
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