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  4. Imaging by time-of-flight secondary ion mass spectrometry of plasma patterned metal and oxide thin films
 
research article

Imaging by time-of-flight secondary ion mass spectrometry of plasma patterned metal and oxide thin films

Coullerez, G.
•
Baborowski, J.  
•
Viornery, C.
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2003
Applied Surface Science

Time-of-flight secondary ion mass spectrometry (ToF-SIMS) imaging is employed to characterize the surface of patterned noble metal (Pt) and titania (TiO2) thin films deposited on oxidized silicon wafers. ToF-SIMS is used to follow the different process steps during the thin films patterning as well as the post-processing cleaning. Both positive and negative ToF-SIMS modes reveal the presence of contaminants, due to the etching processes (Cl- Al-,(+)), but only on the etched surfaces. Elements due to the post-processing cleaning (K+, Na+, Pb+) and photoresist residues are also detected but on the entire wafer surface. The utility of these chemically well-defined titania/platinum patterns is demonstrated for the,selective adsorption of phosphonic acid derivatives. Typical fragments of phosphonic acid groups, i.e. PO2- and PO3- show their preferential adsorption on TiO2. (C) 2002 Elsevier Science B.V. All rights reserved.

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Type
research article
DOI
10.1016/S0169-4332(02)00730-4
Web of Science ID

WOS:000180527300120

Author(s)
Coullerez, G.
Baborowski, J.  
Viornery, C.
Chevolot, Y.
Xanthopoulos, N.  
Ledermann, N.  
Muralt, P.  
Setter, N.  
Mathieu, H. J.
Date Issued

2003

Published in
Applied Surface Science
Volume

203

Start page

527

End page

531

Subjects

tof-sims

•

imaging

•

selective adsorption

•

titania

•

phosphonic acid

•

ecr/rf reactor

•

actuators

Note

Mathieu, Hj EPFL, Swiss Fed Inst Technol, Surface Anal Grp, CH-1015 Lausanne, Switzerland EPFL, Swiss Fed Inst Technol, Surface Anal Grp, CH-1015 Lausanne, Switzerland EPFL, Swiss Fed Inst Technol, Dept Mat Sci, Ceram Lab, CH-1015 Lausanne, Switzerland EPFL, Swiss Fed Inst Technol, Dept Chem, CH-1015 Lausanne, Switzerland

637RT

Cited References Count:8

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LC  
Available on Infoscience
August 21, 2006
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/233504
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