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research article

Properties of aluminum nitride thin films for piezoelectric transducers and microwave filter applications

Dubois, M. A.
•
Muralt, P.  
1999
Applied Physics Letters

Aluminum nitride thin films have been grown by reactive magnetron sputter technique using a pulsed power supply. The highly (002)-textured columnar films deposited on platinized silicon substrates exhibited quasi-single-crystal piezoelectric properties. The effective d(33) was measured as 3.4 pm/V, the effective e(31) as 1.0 C/m(2). The pyroelectric coefficient turned out to be positive (4.8 mu C m(-2) K-1) due to a dominating piezoelectric contribution. Thin-film bulk acoustic resonators (TFBAR) with fundamental resonance at 3.6 GHz have been fabricated to assess resonator properties. The material parameters derived from the thickness resonance were a coupling factor k=0.23 and a sound velocity v(s) = 11 400 m/s. With a quality factor Q of 300, the TFBARs proved to be apt for filter applications. The temperature coefficient of the frequency could be tuned to practically 0 ppm/K. (C) 1999 American Institute of Physics. [S0003-6951(99)01620-4].

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Type
research article
DOI
10.1063/1.124055
Web of Science ID

WOS:000080352700042

Author(s)
Dubois, M. A.
Muralt, P.  
Date Issued

1999

Published in
Applied Physics Letters
Volume

74

Issue

20

Start page

3032

End page

3034

Note

Dubois, Ma Swiss Fed Inst Technol, Dept Mat, Ceram Lab, CH-1015 Lausanne, Switzerland Swiss Fed Inst Technol, Dept Mat, Ceram Lab, CH-1015 Lausanne, Switzerland

197EU

Cited References Count:16

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LC  
Available on Infoscience
August 21, 2006
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/233369
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