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research article

Perovskite Flash Memory with a Single-Layer Nanofloating Gate

Vasilopoulou, Maria
•
Kim, Byung Soon
•
Kim, Hyeong Pil
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July 8, 2020
Nano Letters

Here we use triple-cation metal-organic halide perovskite single crystals for the transistor channel of a flash memory device. Moreover, we design and demonstrate a 10 nm thick single-layer nanofloating gate. It consists of a ternary blend of two organic semiconductors, a p-type polyfluorene and an n-type fullerene that form a donor:acceptor interpenetrating network that serves as the charge storage unit, and of an insulating polystyrene that acts as the tunneling dielectric. Under such a framework, we realize the first non-volatile flash memory transistor based on a perovskite channel. This simplified, solution-processed perovskite flash memory displays unique performance metrics such as a large memory window of 30 V, an on/off ratio of 9 x 10(7), short write/erase times of 50 ms, and a satisfactory retention time exceeding 10(6) s. The realization of the first flash memory transistor using a single-crystal perovskite channel could be a valuable direction for perovskite electronics research.

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Type
research article
DOI
10.1021/acs.nanolett.0c01270
Web of Science ID

WOS:000548893200051

Author(s)
Vasilopoulou, Maria
Kim, Byung Soon
Kim, Hyeong Pil
da Silva, Wilson Jose
Schneider, Fabio Kurt
Teridi, Mohd Asri Mat
Gao, Peng  
Yusoff, Abd Rashid bin Mohd
Nazeeruddin, Mohammad Khaja  
Date Issued

2020-07-08

Published in
Nano Letters
Volume

20

Issue

7

Start page

5081

End page

5089

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
GMF  
Available on Infoscience
June 8, 2021
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/178754
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