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  4. Eliminating Exposure Bias and Metric Mismatch in Multiple Object Tracking
 
conference paper

Eliminating Exposure Bias and Metric Mismatch in Multiple Object Tracking

Maksai, Andrii  
•
Fua, Pascal  
June 23, 2019
2019 Ieee/Cvf Conference On Computer Vision And Pattern Recognition (Cvpr 2019)
IEEE/CVF Conference on Computer Vision and Pattern Recognition (CVPR)

Identity Switching remains one of the main difficulties Multiple Object Tracking (MOT) algorithms have to deal with. Many state-of-the-art approaches now use sequence models to solve this problem but their training can be affected by biases that decrease their efficiency. In this paper, we introduce a new training procedure that confronts the algorithm to its own mistakes while explicitly attempting to minimize the number of switches, which results in better training. We propose an iterative scheme of building a rich training set and using it to learn a scoring function that is an explicit proxy for the target tracking metric. Whether using only simple geometric features or more sophisticated ones that also take appearance into account, our approach outperforms the state-of-the-art on several MOT benchmarks.

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Type
conference paper
DOI
10.1109/CVPR.2019.00477
Web of Science ID

WOS:000529484004083

Author(s)
Maksai, Andrii  
Fua, Pascal  
Date Issued

2019-06-23

Publisher

IEEE

Published in
2019 Ieee/Cvf Conference On Computer Vision And Pattern Recognition (Cvpr 2019)
ISBN of the book

978-1-7281-3293-8

Total of pages

8

Start page

4634

End page

4643

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
CVLAB  
Event nameEvent placeEvent date
IEEE/CVF Conference on Computer Vision and Pattern Recognition (CVPR)

Long Beach, CA

Jun 16-20, 2019

Available on Infoscience
May 23, 2019
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/156522
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