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research article

Analytical Modeling of Cryogenic Subthreshold Currents in 22-nm FDSOI Technology

Han, Hung-Chi  
•
Zhao, Zhixing
•
Lehmann, Steffen
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January 1, 2024
IEEE Electron Device Letters

The transistor compact model is crucial but has yet to mature for cryogenic electronics. This paper presents a sophisticated analytical model of the MOSFET subthreshold current at cryogenic temperatures, accounting for the thermionic, hopping, source-to-drain tunneling transports, and the Gaussian-distributed interface traps to bridge the gap. Hopping and source-to-drain tunneling transports can co-exist in the subthreshold regime, leading to subthreshold saturation strongly correlated to channel length and drain voltages.

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Type
research article
DOI
10.1109/LED.2023.3331022
Web of Science ID

WOS:001134459600012

Author(s)
Han, Hung-Chi  
Zhao, Zhixing
Lehmann, Steffen
Charbon, Edoardo  
Enz, Christian  
Date Issued

2024-01-01

Publisher

Institute of Electrical and Electronics Engineers

Published in
IEEE Electron Device Letters
Volume

45

Issue

1

Start page

92

End page

95

Subjects

Technology

•

Cryo-Cmos

•

Band Tail

•

Fdsoi

•

Hopping

•

Modeling

•

Quantum Computing

•

Subthreshold

•

Tunneling

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
AQUA  
ICLAB  
FunderGrant Number

European Union's Horizon 2020, SEQUENCE

Available on Infoscience
February 21, 2024
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/204983
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