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research article

All-stencil transistor fabrication on 3D silicon substrates

Villanueva, Guillermo  
•
Vazquez-Mena, O.  
•
Martin-Olmos, C.
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2012
Journal of Micromechanics and Microengineering

The standard lithographic techniques to fabricate electronic components involve the use of polymers, baking steps and chemicals. This typically restricts their application to flat substrates made up of standard materials. Stencil lithography has been proposed as a stable alternative to the standard lithographic techniques. In this paper, we demonstrate the completely resistless all-through-stencil fabrication of electronic components, by performing all essential fabrication steps—implantation, etching and metallization—using stencil lithography. This is performed on a planar substrate as well as on pre-patterned 3D substrates, thus showing the potential of this technique for applications in the field of accelerometers, pressure, gas and radiation sensors.

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Type
research article
DOI
10.1088/0960-1317/22/9/095022
Web of Science ID

WOS:000308210600032

Author(s)
Villanueva, Guillermo  
Vazquez-Mena, O.  
Martin-Olmos, C.
Savu, V.  
Sidler, K.  
Montserrat, J.
Langlet, P.  
Hibert, C.  
Vettiger, P.
Bausells, J.
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Date Issued

2012

Publisher

Iop Publishing Ltd

Published in
Journal of Micromechanics and Microengineering
Volume

22

Issue

9

Article Number

095022

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

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NEMS  
CMI  
LMIS1  
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/84991
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