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  4. 3D microfabrication by combining microstereolithography and thick resist UV lithography
 
research article

3D microfabrication by combining microstereolithography and thick resist UV lithography

Bertsch, Arnaud  
•
Lorenz, Hubert
•
Renaud, Philippe  
1999
Sensors and Actuators A: Physical

A new approach for the realization of true 3D polymer structures is presented in this paper. It consists in adding, in a post-processing microstereolithography step, 3D polymer microstructures on top of a micropart patterned by means of planar processes such as thin films, bulk silicon etching or high aspect ratio structuration (LIGA, RIE, thick resist). In this way, some shape limitations of the planar technologies can be overcome for new functional applications. Moreover, the direct processing of microstereolithography on predefined structures eliminates manipulations which are associated with micro-assembly of separated parts. To demonstrate this combination of microstructuration processes, an example showing a conical axle added by microstereolithography on a SU-8 piece of gearing is presented. (C) 1999 Elsevier Science S.A. All rights reserved.

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Type
research article
DOI
10.1016/S0924-4247(98)00249-0
Web of Science ID

WOS:000079301700003

Author(s)
Bertsch, Arnaud  
Lorenz, Hubert
Renaud, Philippe  
Date Issued

1999

Publisher

Elsevier

Published in
Sensors and Actuators A: Physical
Volume

73

Issue

1-2

Start page

14

End page

23

Subjects

dynamic mask-generator

•

microstereophotolithography

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LMIS4  
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/216138
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