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  4. High numerical aperture silicon collimating lens for mid-infrared quantum cascade lasers manufactured using wafer-level techniques
 
conference paper

High numerical aperture silicon collimating lens for mid-infrared quantum cascade lasers manufactured using wafer-level techniques

Logean, Eric  
•
Hvozdara, Lubos  
•
Di Francesco, Joab  
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2012
Optical Systems Design 2012
SPIE Optical Systems Design

We present an aspheric collimating lens for mid-infrared (4-14 µ) quantum cascade lasers. The lenses were etched into silicon by an inductively coupled plasma reactive ion etching system on wafer level. The high refractive index of silicon reduces the height of the lens prole resulting in a simple element working at high numerical aperture (up to 0.82). Wafer level processes enable the fabrication of about 5000 lenses in parallel. Such cost-eective collimating lens is a step towards the adoption of quantum cascade lasers for all its potential applications.

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Type
conference paper
DOI
10.1117/12.981165
Author(s)
Logean, Eric  
Hvozdara, Lubos  
Di Francesco, Joab  
Herzig, Hans Peter  
Voelkel, Reinhard
Eisner, Martin
Baroni, Pierre-Yves  
Rochat, Michel
Müller, Antoine
Date Issued

2012

Published in
Optical Systems Design 2012
Series title/Series vol.

SPIE Proceedings; 8550

Start page

85500Q

Subjects

Optical collimation

•

mid-infrared micro-optics

•

quantum cascade laser

•

reactive ion etching

•

mass production

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
OPT  
Event nameEvent placeEvent date
SPIE Optical Systems Design

Barcelona, Spain

November 26-29, 2012

Available on Infoscience
January 21, 2013
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/87985
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