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  4. Fast and Efficient Light Intensity Modulation in SOI with Gate-All-Around Transistor Phase Modulator
 
conference paper

Fast and Efficient Light Intensity Modulation in SOI with Gate-All-Around Transistor Phase Modulator

Dainesi, P.  
•
Moselund, K. E.  
•
Thévenaz, Luc  
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2006
Proceedings of the 2005 Conference on Lasers and Electro-Optics
2005 Conference on Lasers and Electro-Optics (CLEO)

We report fast modulation (>30 GHz) in a SOI resonant cavity using integrated Bragg mirrors and a gate-all-around transistor as active element. Modulation depth >90% can be obtained in 12.5 μm long devices.

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Type
conference paper
DOI
10.1109/CLEO.2005.201693
Web of Science ID

WOS:000234819900038

Author(s)
Dainesi, P.  
Moselund, K. E.  
Thévenaz, Luc  
Ionescu, A. M.  
Date Issued

2006

Publisher

IEEE

Published in
Proceedings of the 2005 Conference on Lasers and Electro-Optics
Volume

1

Start page

110

End page

112

Subjects

integrated optics

•

mirrors

•

optical modulation

•

phase modulation

•

silicon-on-insulator

•

light intensity modulation

•

gate-all-around transistor phase modulator

•

SOI resonant cavity

•

integrated Bragg mirrors

•

modulation depth

•

12.5 micron

•

Si-SiO2

URL

URL

http://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=1572759
Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
THEVE  
NANOLAB  
SCI-STI-LT  
Event nameEvent placeEvent date
2005 Conference on Lasers and Electro-Optics (CLEO)

Baltimore, USA

2005

Available on Infoscience
May 16, 2007
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/6929
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