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  4. Characterization of InGaAs and InAlAs layers on InP by four-crystal high resolution X-ray diffraction and wedge transmission electron microscopy
 
conference paper

Characterization of InGaAs and InAlAs layers on InP by four-crystal high resolution X-ray diffraction and wedge transmission electron microscopy

Houdré, R.
•
Gueissaz, F.
•
Gailhanou, M.
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1991
Journal of Crystal Growth
6th International Conference on Molecular Beam Epitaxy

The indium desorption rates from InGaAs and InAlAs grown on InP substrates have been measured by wedge transmission electron microscopy as a function of the growth temperature. Desorption becomes significant at 545-degrees-C for both materials. No automatching effects could be observed under the growth conditions of the experiment. The bandgap of In(y)Al1-yAs has been measured at 77 K as a function of the indium content. The composition and the strain have been measured by four-crystal high resolution X-ray diffraction with symmetrical (004) and assymmetrical (115 +/-) Bragg reflections. The intrinsic bandgap follows the relation E(g)(y) = 2.774 - 2.411 y and the strained material the relation E(gs)(y) = 0.671 + 5.236y-6.929y2.

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Type
conference paper
DOI
10.1016/0022-0248(91)91019-7
Web of Science ID

WOS:A1991FT19000083

Author(s)
Houdré, R.
Gueissaz, F.
Gailhanou, M.
Ganiére, J.-D.
Rudra, A.  
Ilegems, M.  
Date Issued

1991

Published in
Journal of Crystal Growth
Volume

111

Issue

1-4

Start page

456

End page

460

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LOEQ  
SCI-SB-RH  
Event name
6th International Conference on Molecular Beam Epitaxy
Available on Infoscience
August 31, 2007
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/11014
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