Repository logo

Infoscience

  • English
  • French
Log In
Logo EPFL, École polytechnique fédérale de Lausanne

Infoscience

  • English
  • French
Log In
  1. Home
  2. Academic and Research Output
  3. Conferences, Workshops, Symposiums, and Seminars
  4. High-temperature compatible 3D-integration processes for a vacuum-sealed CNT-based NEMS
 
conference paper

High-temperature compatible 3D-integration processes for a vacuum-sealed CNT-based NEMS

Gueye, R.
•
Lee, S. W.
•
Akiyama, T.  
Show more
2013
Reliability, Packaging, Testing, and Characterization of MOEMS/MEMS and Nanodevices XII

A System-in-Package (SiP) concept for the 3D-integration of a Single Wall Carbon Nanotube (SWCNT) resonator with its CMOS driving electronics is presented. The key element of this advanced SiP is the monolithic 3D-integration of the MEMS with the CMOS electronics using Through Silicon Vias (TSVs) on an SOI wafer. This SiP includes: • A glass cap vacuum-sealed to the main wafer using an eutectic bonding process: a low leak rate of 2.7 × 10 -9 mbar·l/s was obtained; • Platinum-TSVs, compatible with the SWCNT growth and release process; The TSVs were developed in a "via first" process and characterized at high-temperature - up to 850°C. An ohmic contact between the Pt-metallization and the SOI silicon device layer was obtained; • The driving CMOS electronic device is assembled to the MEMS using an Au stud bump technology. Keywords: System-in-Package (SiP), vacuum packaging, eutectic bonding, "via-first" TSVs, high-temperature platinum interconnects, ohmic contacts, Au-stud bumps assembly, CMOS electronics. © 2013 Copyright SPIE.

  • Details
  • Metrics
Logo EPFL, École polytechnique fédérale de Lausanne
  • Contact
  • infoscience@epfl.ch

  • Follow us on Facebook
  • Follow us on Instagram
  • Follow us on LinkedIn
  • Follow us on X
  • Follow us on Youtube
AccessibilityLegal noticePrivacy policyCookie settingsEnd User AgreementGet helpFeedback

Infoscience is a service managed and provided by the Library and IT Services of EPFL. © EPFL, tous droits réservés