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  4. Monte Carlo Modeling of Electron Multiplication in Amorphous Silicon Based Microchannel Plates
 
conference paper

Monte Carlo Modeling of Electron Multiplication in Amorphous Silicon Based Microchannel Plates

Loffler, J.
•
Thomet, J.
•
Belhaj, M.
Show more
2019
2019 IEEE Nuclear Science Symposium and Medical Imaging Conference (NSS/MIC)
2019 IEEE Nuclear Science Symposium and Medical Imaging Conference (NSS/MIC)

Amorphous silicon based microchannel plates are being developed to overcome performance limits of conventional microchannel plates. They offer a new flexibility and ease of fabrication. A comprehensive AMCP model is being constructed to analyze the performances of AMCPs. It includes Monte Carlo simulation of secondary electron emission distribution as a function of energy and angles and finite element analysis multiphysics software to compute electron trajectories. The paper presents the results of Monte Carlo simulations of secondary emission functions in silicon and the high secondary emissive material Al 2 O 3 . We discuss the gain and potential performance as a function of geometry of such devices. The validity of the Eberhardt model for the analysis of AMCPs is also addressed.

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Type
conference paper
DOI
10.1109/NSS/MIC42101.2019.9059971
Author(s)
Loffler, J.
Thomet, J.
Belhaj, M.
Kessel, L. van
Hagen, C. W.
Ballif, C.
Wyrsch, Nicolas  
Date Issued

2019

Publisher

IEEE

Published in
2019 IEEE Nuclear Science Symposium and Medical Imaging Conference (NSS/MIC)
ISBN of the book

978-1-728141-64-0

Start page

1

End page

6

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
PV-LAB  
Event nameEvent placeEvent date
2019 IEEE Nuclear Science Symposium and Medical Imaging Conference (NSS/MIC)

Manchester, United Kingdom

October 26- November 2, 2019

Available on Infoscience
February 5, 2021
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/175140
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