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  4. Bias Dependence of Total Ionizing Dose Effects on 28-nm Bulk MOSFETs
 
conference paper

Bias Dependence of Total Ionizing Dose Effects on 28-nm Bulk MOSFETs

Zhang, Chunmin  
•
Jazaeri, Farzan  
•
Borghello, Giulio
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2018
Proceedings of 2018 IEEE Nuclear Science Symposium and Medical Imaging Conference
2018 IEEE Nuclear Science Symposium Conference Record

This paper investigates the effects of total ionizing dose up to 1 Grad on 28-nm bulk MOSFETs under different bias conditions during irradiation. The aim is to assess the potential use of this commercial bulk CMOS technology in the future high-luminosity Large Hadron Collider at CERN that will require highly improved radiation-tolerant tracking systems.

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Type
conference paper
DOI
10.1109/NSSMIC.2018.8824379
Author(s)
Zhang, Chunmin  
Jazaeri, Farzan  
Borghello, Giulio
Mattiazzo, Serena
Baschirotto, Andrea
Enz, Christian  
Date Issued

2018

Published in
Proceedings of 2018 IEEE Nuclear Science Symposium and Medical Imaging Conference
ISBN of the book

978-1-5386-8494-8

Total of pages

3

Subjects

GigaRadMOST

•

Semiconductor device modeling

•

Bias condition

•

Interface traps

•

Narrow-channel effect

•

1 Grad

•

Oxide traps

•

Short-channel effect

•

Total ionizing dose

•

28-nm bulk MOSFETs

Note

This work was supported in part by the GigaRadMOST project funded by the Swiss National Science Foundation under Grant 200021_160185 and in part by the ScalTech28 project funded by the Istituto Nazionale di Fisica Nucleare.

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
ICLAB  
Event nameEvent placeEvent date
2018 IEEE Nuclear Science Symposium Conference Record

Sydney, Australia

November 11-17, 2018

Available on Infoscience
April 1, 2019
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/155859
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