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  4. Robustness Analysis of Metasurfaces: Perfect Structures Are Not Always the Best
 
research article

Robustness Analysis of Metasurfaces: Perfect Structures Are Not Always the Best

Wang, Hsiang-Chu  
•
Achouri, Karim  
•
Martin, Olivier J. F.  
June 28, 2022
Acs Photonics

Optical metasurfaces rely on subwavelength scale nanostructures, which puts significant constraints on nanofabrication accuracies. These constraints are becoming increasingly important, as metasurfaces are maturing toward real applications that require the fabrication of very large area samples. Here, we focus on beam steering gradient metasurfaces and show that perfect nanofabrication does not necessarily equate with best performances: metasurfaces with missing elements can actually be more efficient than intact metasurfaces. Both plasmonic metasurfaces in reflection and dielectric metasurfaces in transmission are investigated. These findings are substantiated by experiments on purposely misfabricated metasurfaces and full-wave calculations. A very efficient quasi-analytical model is also introduced for the design and simulations of metasurfaces; it agrees very well with full wave calculations. Our findings indicate that the substrate properties play a key role in the robustness of a metasurface and the smoothness of the approximated phase gradient controls the device efficiency.

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Type
research article
DOI
10.1021/acsphotonics.2c00563
Web of Science ID

WOS:000822432000001

Author(s)
Wang, Hsiang-Chu  
Achouri, Karim  
Martin, Olivier J. F.  
Date Issued

2022-06-28

Publisher

AMER CHEMICAL SOC

Published in
Acs Photonics
Volume

9

Issue

7

Start page

2438

End page

2447

Subjects

Nanoscience & Nanotechnology

•

Materials Science, Multidisciplinary

•

Optics

•

Physics, Applied

•

Physics, Condensed Matter

•

Science & Technology - Other Topics

•

Materials Science

•

Physics

•

metasurfaces

•

beam steering

•

imperfection

•

plasmonics

•

dielectric

•

efficiency

•

plasmonic metasurfaces

•

lithography

•

fabrication

•

nanoparticle

•

generation

•

absorbers

•

design

•

optics

•

uv

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
NAM  
Available on Infoscience
August 1, 2022
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/189542
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