research article
a-Si:H/a-Si:H Stacked Cell from VHF-Deposition in a Single Chamber Reactor with 9% Stabilized Efficiency
Type
research article
Author(s)
Platz, R.
Fischer, D.
Dubail, S.
Shah, A.
Date Issued
1997
Published in
Volume
46
Start page
157
End page
172
Note
IMT-NE Number: 254
Editorial or Peer reviewed
REVIEWED
Written at
OTHER
EPFL units
Use this identifier to reference this record