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research article

Electron beam-based direct writing of nanostructures using a palladium β-ketoesterate complex

Jureddy, Chinmai Sai  
•
Mackosz, Krzysztof
•
Butrymowicz-Kubiak, Aleksandra
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April 15, 2025
Beilstein Journal Of Nanotechnology

Gas-assisted focused electron beam-induced deposition (FEBID) as a direct, minimally invasive 3D nanopatterning tool offers many advantages in making nanostructures with complex shapes and novel compositions for evolving nanotechnological applications. In this work, structures were nanoprinted using a fluorine-free (3-ketoesterate complex, bis(tert-butylacetoacetate)palladium(II), [Pd(tbaoac)2]. The internal nanostructure and composition of the deposits were determined, and possible volatile products produced under electron-induced dissociation, explaining the composition, are investigated. A method to eliminate the residual gas contamination during FEBID was implemented. [Pd(tbaoac)2] contains large organic ligands and only about 5 atom % palladium in the pristine molecule, yet the obtained palladium content in the deposits amounts to around 30 atom %. This translates to an exceptional removal efficiency of about 90% for the ligand-constituting elements carbon and oxygen through electron-induced dissociation and desorption mechanisms. Comparison with other precursors confirms that the (3-ketoesterate family has the highest ligand removal percentage and constitutes thus an interesting model chemistry for further high-metal-content FEBID studies. The possibility of growing nanopillars makes this complex a promising precursor for nanoprinting 3D structures with finely

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Type
research article
DOI
10.3762/bjnano.16.41
Web of Science ID

WOS:001469167500001

Author(s)
Jureddy, Chinmai Sai  

École Polytechnique Fédérale de Lausanne

Mackosz, Krzysztof

Swiss Federal Institutes of Technology Domain

Butrymowicz-Kubiak, Aleksandra

Nicolaus Copernicus Univ Torun NCU

Szymanska, Iwona B.

Nicolaus Copernicus Univ Torun NCU

Hoffmann, Patrik  

École Polytechnique Fédérale de Lausanne

Utke, Ivo

Swiss Federal Institutes of Technology Domain

Date Issued

2025-04-15

Publisher

BEILSTEIN-INSTITUT

Published in
Beilstein Journal Of Nanotechnology
Volume

16

Start page

530

End page

539

Subjects

3D nanoprinting

•

electron-induced molecule dissociation

•

focused electron beam-induced deposition

•

metal nanostructures

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metalorganic complexes

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LPMAT  
FunderFunding(s)Grant NumberGrant URL

Swiss National Science Foundation (SNSF)

COST-SNSF project

IZCOZ0_205450

European Union (EU)

CA 19140

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Available on Infoscience
April 30, 2025
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/249588
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