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conference paper
Crystal Phase Tuning in Planar Films of III-V Semiconductors
January 1, 2019
2019 Compound Semiconductor Week (Csw)
We report on the control of the crystal phase of micron-sized planar III-V semiconductor films grown on top of standard (001) oriented substrates. We achieve this by confining the MOCVD process using SiO2 templates and selecting specific growth planes. We further characterize InP films using STEM, PL and CL and find phase purities of 100% and 97% for zinc-blende (ZB) and wurtzite (WZ), respectively.
Type
conference paper
Web of Science ID
WOS:000539485600154
Author(s)
Staudiner, Philipp
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Mauthe, Svenja
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Schmid, Heinz
Date Issued
2019-01-01
Publisher
Publisher place
New York
Journal
2019 Compound Semiconductor Week (Csw)
ISBN of the book
978-1-7281-0080-7
Peer reviewed
REVIEWED
Written at
EPFL
| Event name | Event place | Event date |
Nara, JAPAN | May 19-23, 2019 | |
Available on Infoscience
July 9, 2020
Use this identifier to reference this record