Repository logo

Infoscience

  • English
  • French
Log In
Logo EPFL, École polytechnique fédérale de Lausanne

Infoscience

  • English
  • French
Log In
  1. Home
  2. Academic and Research Output
  3. Journal articles
  4. Potential of a plasma bound between two biased walls
 
research article

Potential of a plasma bound between two biased walls

Loizu, J.
•
Dominski, J.
•
Ricci, P.
Show more
2012
Physics of Plasmas

An analytical study is presented for an one-dimensional, steady-state plasma bound between two perfectly absorbing walls that are biased with respect to each other. Starting from a description of the plasma sheaths formed at both walls, an expression relating the bulk plasma potential to the wall currents is derived, showing that the plasma potential undergoes an abrupt transition when currents cross a critical value. This result is confirmed by numerical simulations performed with a particle-in-cell code. [http://dx.doi.org/10.1063/1.4745863]

  • Files
  • Details
  • Metrics
Type
research article
DOI
10.1063/1.4745863
Web of Science ID

WOS:000309252500099

Author(s)
Loizu, J.
Dominski, J.
Ricci, P.
Theiler, C.
Date Issued

2012

Publisher

American Institute of Physics

Published in
Physics of Plasmas
Volume

19

Issue

8

Article Number

083507

Subjects

CRPP_EDGE

•

TORPEX

Editorial or Peer reviewed

NON-REVIEWED

Written at

EPFL

EPFL units
CRPP  
SPC  
Available on Infoscience
August 20, 2012
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/84949
Logo EPFL, École polytechnique fédérale de Lausanne
  • Contact
  • infoscience@epfl.ch

  • Follow us on Facebook
  • Follow us on Instagram
  • Follow us on LinkedIn
  • Follow us on X
  • Follow us on Youtube
AccessibilityLegal noticePrivacy policyCookie settingsEnd User AgreementGet helpFeedback

Infoscience is a service managed and provided by the Library and IT Services of EPFL. © EPFL, tous droits réservés