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  4. Minimized Blurring in Stencil Lithography using a Compliant Membrane
 
conference presentation

Minimized Blurring in Stencil Lithography using a Compliant Membrane

Sidler, K.  
•
Villanueva, G.  
•
Vazquez-Mena, O.  
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2009
The 15th International Conference on Solid-State Sensors, Actuators and Microsystems (Transducers 2009)
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Type
conference presentation
Author(s)
Sidler, K.  
Villanueva, G.  
Vazquez-Mena, O.  
Brugger, J.  
Date Issued

2009

Written at

EPFL

EPFL units
LMIS1  
NEMS  
Event nameEvent placeEvent date
The 15th International Conference on Solid-State Sensors, Actuators and Microsystems (Transducers 2009)

Denver, Colorado, USA

June 21-25 2009

Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/35713
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