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  4. High growth rate deposition of hydrogenated microcrystalline Silicon by a high current DC discharge
 
report

High growth rate deposition of hydrogenated microcrystalline Silicon by a high current DC discharge

Franz, D.
•
Grangeon, F.
•
Delachaux, T
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1999
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Type
report
Author(s)
Franz, D.
Grangeon, F.
Delachaux, T
Howling, A.A.  
Hollenstein, Ch.  
Date Issued

1999

Subjects

LRP 640

Written at

EPFL

EPFL units
CRPP  
SPC  
Available on Infoscience
April 18, 2008
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/23199
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