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patent

Ferroelectric device or structure and a method for producing ferroelectric devices or structures

Kippenberg, Tobias  
•
Tan, Zelin  
•
Wang, Rui  
2023

The present invention concerns a method for producing at least one ferroelectric device or structure comprising the steps of providing at least one ferroelectric material or layer, or providing at least one ferroelectric material or layer to be patterned or structured; depositing at least one adhesion layer on a first side of the at least one ferroelectric material or layer; and depositing at least one diamond-like carbon layer or material on the at least one adhesion layer.

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Type
patent
EPO Family ID

80001351

Author(s)
Kippenberg, Tobias  
Tan, Zelin  
Wang, Rui  
Note

Alternative title(s) : (fr) Dispositif ou structure ferroélectrique et procédé de production de dispositifs ou de structures ferroélectriques

TTO classification

TTO:6.2247

EPFL units
AVP-R-TTO  
DOICountry codeKind codeDate issued

WO2023118926

WO

A1

2023-06-29

Available on Infoscience
July 3, 2023
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/198812
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