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research article

Photoelectron microscopy and its applications to semiconductor science

Margaritondo, G.  
1999
Japanese Journal of Applied Physics Part 1-Regular Papers Short Notes & Review Papers

Photoelectron spectromicroscopy, the combination of conventional photoelectron spectroscopy and high lateral resolution, is a novel technique that exploits the high brightness of the most recent synchrotron sources. We briefly review its main implementation modes and present some examples of applications, with particular emphasis on semiconductor interface research.

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Type
research article
DOI
10.7567/JJAPS.38S1.8
Web of Science ID

WOS:000082804000003

Author(s)
Margaritondo, G.  
Date Issued

1999

Published in
Japanese Journal of Applied Physics Part 1-Regular Papers Short Notes & Review Papers
Volume

38

Start page

8

End page

13

Subjects

synchrotron light

•

photoemission

•

spectroscopy

•

microscopy

•

spectromicroscopy

•

semiconductors

•

SCALE LATERAL INHOMOGENEITIES

•

SPECTROMICROSCOPY

•

PHOTOEMISSION

•

SPECTROMICROSCOPY

Note

Ecole Polytech Fed Lausanne, Inst Phys Appl, CH-1015 Lausanne, Switzerland. Sincrotrone Trieste, Trieste, Italy. Margaritondo, G, Ecole Polytech Fed Lausanne, Inst Phys Appl, CH-1015 Lausanne, Switzerland.

ISI Document Delivery No.: 240AT

Suppl. 1

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LSE  
LPRX  
Available on Infoscience
October 3, 2006
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/234809
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