Photoelectron microscopy and its applications to semiconductor science

• Published in: Japanese Journal of Applied Physics Part 1-Regular Papers Short Notes & Review Papers (ISSN: 0021-4922), vol. 38, p. 8-13
• Publication date: 1999

Photoelectron spectromicroscopy, the combination of conventional photoelectron spectroscopy and high lateral resolution, is a novel technique that exploits the high brightness of the most recent synchrotron sources. We briefly review its main implementation modes and present some examples of applications, with particular emphasis on semiconductor interface research.

Keywords: synchrotron light ; photoemission ; spectroscopy ; microscopy ; spectromicroscopy ; semiconductors ; SCALE LATERAL INHOMOGENEITIES ; SPECTROMICROSCOPY ; PHOTOEMISSION ; SPECTROMICROSCOPY

Note:

Ecole Polytech Fed Lausanne, Inst Phys Appl, CH-1015 Lausanne, Switzerland. Sincrotrone Trieste, Trieste, Italy. Margaritondo, G, Ecole Polytech Fed Lausanne, Inst Phys Appl, CH-1015 Lausanne, Switzerland.

ISI Document Delivery No.: 240AT

Suppl. 1

Reference

• LSE-ARTICLE-1999-017
• View record in Web of Science

Record created on 2006-10-03, modified on 2017-05-12