Chemisorption and Physisorption of Simple Alcohols on Cleaved Silicon
We investigated the adsorption properties of methanol and ethanol on Si(111)2 x 1 as a function of temperature in the range 80-300 K by means of synchrotron radiation photoemission of core and valence levels. A physisorbed state is characterized at 80 K, whereas at 300 K an alcohoxy species is formed. White-light exposures promote a decomposition reaction which leads to carbon on the Si surface, either on elemental form or as CH(x) groups.
WOS:A1991GA28800004
1991
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Univ rome la sapienza,dept chem,i-00185 rome,italy. univ wisconsin,ctr synchrotron radiat,madison,wi 53706. univ wisconsin,dept phys,madison,wi 53706. ecole polytech fed lausanne,inst appl phys,ch-1015 lausanne,switzerland. Piancastelli, mn, univ rome tor vergata 2,dept chem sci & technol,i-00173 rome,italy.
ISI Document Delivery No.: GA288
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