Infoscience

Journal article

Reduction of Silicon-Aluminum Interdiffusion by Improved Semiconductor Surface Ordering

    Note:

    Univ wisconsin,dept phys,madison,wi 53706. Brillson, lj, xerox corp,webster res ctr,webster,ny 14580.

    ISI Document Delivery No.: RZ083

    Reference

    Record created on 2006-10-03, modified on 2016-08-08

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