Reduction of Silicon-Aluminum Interdiffusion by Improved Semiconductor Surface Ordering


Published in:
Applied Physics Letters, 44, 1, 110-112
Year:
1984
ISSN:
0003-6951
Note:
Univ wisconsin,dept phys,madison,wi 53706. Brillson, lj, xerox corp,webster res ctr,webster,ny 14580.
ISI Document Delivery No.: RZ083
Laboratories:




 Record created 2006-10-03, last modified 2018-03-18


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