Atomic-Interlayer-Controlled Diffusion at Semiconductor-Semiconductor Interfaces
1980
Details
Title
Atomic-Interlayer-Controlled Diffusion at Semiconductor-Semiconductor Interfaces
Author(s)
Margaritondo, G. ; Stoffel, N. G. ; Katnani, A. D. ; Brillson, L. J.
Published in
Applied Physics Letters
Volume
37
Issue
10
Pages
917-918
Date
1980
ISSN
0003-6951
Note
Xerox corp,webster res ctr,webster,ny 14580. Margaritondo, g, univ wisconsin,dept phys,madison,wi 53706.
ISI Document Delivery No.: LB785
ISI Document Delivery No.: LB785
DOI
10.1063/1.91858
Record Appears in
Scientific production and competences > Archives > SB - School of Basic Sciences > LSE - Laboratory of Photoelectron Spectroscopy
Scientific production and competences > Archives > SB - School of Basic Sciences > LPRX - X-Ray Physics Laboratory
LSE - Laboratory of Photoelectron Spectroscopy
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Scientific production and competences > Archives > SB - School of Basic Sciences > LPRX - X-Ray Physics Laboratory
LSE - Laboratory of Photoelectron Spectroscopy
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published