Infoscience

Journal article

Atomic-Interlayer-Controlled Diffusion at Semiconductor-Semiconductor Interfaces

    Note:

    Xerox corp,webster res ctr,webster,ny 14580. Margaritondo, g, univ wisconsin,dept phys,madison,wi 53706.

    ISI Document Delivery No.: LB785

    Reference

    Record created on 2006-10-03, modified on 2016-08-08

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