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Atomic-Interlayer-Controlled Diffusion at Semiconductor-Semiconductor Interfaces

Margaritondo, G. ; Stoffel, N. G. ; Katnani, A. D. ; Brillson, L. J.

Published in:
Applied Physics Letters, 37, 10, 917-918
Year:
1980
ISSN:
0003-6951
Note:
Xerox corp,webster res ctr,webster,ny 14580. Margaritondo, g, univ wisconsin,dept phys,madison,wi 53706.
ISI Document Delivery No.: LB785
DOI:
10.1063/1.91858
Laboratories:
LPRX
LSE

Record appears in:
Scientific production and competences > SB - School of Basic Sciences > IPHYS - Institute of Physics > LSE - Laboratory of Photoelectron Spectroscopy
Scientific production and competences > SB - School of Basic Sciences > IPHYS - Institute of Physics > LPRX - X-Ray Physics Laboratory
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published



 Record created 2006-10-03, last modified 2018-03-18


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