Mass-Spectrometric Detection of Low-Ppm Contaminants in Sputter Process Systems at 10-2 Mbar, Using a Directly Exposed Ion-Source

Trace contaminants in sputter atmospheres (10(-2) mbar Ar) are determined with a mass spectrometer whose ionizer is directly exposed to the process pressure, whereas the quadrupole filter is kept at high vacuum. The background limitations inherent to conventional differentially pumped analyzers are overcome. Detection limits are 1 ppm for H2O and few ppb for other species.


Published in:
Vacuum, 41, 7-9, 2106-2108
Year:
1990
ISSN:
0042-207X
Note:
Koprio, J Balzers Ag,Fl-9496 Balzers,Liechtenstein
Ev616
Times Cited:3
Cited References Count:3
Laboratories:




 Record created 2006-08-21, last modified 2018-03-17


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