Recent developments are going towards miniaturized devices and structures. Besides advanced photolithography techniques, complementary patterning methods are evolving. Among them is the nanostencil technique. This technique is about defining patterns under vacuum by evaporation of metal through stencil apertures. Such a stencil can be used either in static or dynamic mode. The latter allows overcoming the limitations of static deposition and in particular offers the possibility to make custom defined structures, for example three dimensional and closed loop structures. The goal of this Master Project is to develop a setup that allows dynamic definition of micro- and nanometer sized structures by means of stencil lithography.