Electrochemical characterization of mechanically implanted boron doped diamond electrodes MI-BDD

A new, low production cost, technique for the preparation of boron-doped diamond electrodes (BDD) is presented. The technique is based on mechanical implantation of BDD particles into a titanium substrate. The electrochemical characterization of low coverage mechanically implanted boron-doped diamond electrodes was performed using the Click to view the MathML source redox couple and compared with the BDD thin-films electrodes. The interpretation of the recorded voltammetric responses was based on microelectrodes-array theory. The thickness of the diffusion layer, the spacing of particles and equivalent particle dimension was considered. Depending on the potential scan rate the linear or spherical diffusion with partial overlap was observed.


Published in:
Electrochemistry Communications, 8, 375-382
Year:
2006
Keywords:
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 Record created 2006-04-11, last modified 2018-03-17


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