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conference paper

Novel low temperature pressure-assisted bonding technology

Sayah, A.  
•
Solignac, D.  
•
Gijs, M. A. M.  
2000
Micromachining and Microfabrication Process Technology VI
SPIE’s 2000 Symposium and Educational Program on Micromachining and Microfabrication

We introduce a new low temperature bonding technology to assemble two microstructured glass substrates for the realization of microchannels for miniaturized chemical analysis applications. To realize the microchannels, we introduce, besides the well-known HF-etching technology, two simple alternative methods, namely sawing and micro-powder blasting. After proper cleaning of the two glass surfaces, direct bonding is obtained just by exposing the glass stack to a high pressure (up to 50 MPa) in the 100-200 °C temperature range. At these low temperatures, we obtain bonding strengths as high as 10 MPa, comparable to the best values reported in literature. As a possible mechanism for this strong bonding, we propose the pressure-induced enhancement of the bonding contact surface.

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Type
conference paper
DOI
10.1117/12.396455
Web of Science ID

WOS:000165734900040

Author(s)
Sayah, A.  
Solignac, D.  
Gijs, M. A. M.  
Date Issued

2000

Published in
Micromachining and Microfabrication Process Technology VI
Series title/Series vol.

SPIE Proceedings; 4174

Written at

EPFL

EPFL units
LMIS2  
Event nameEvent placeEvent date
SPIE’s 2000 Symposium and Educational Program on Micromachining and Microfabrication

Santa Clara, USA

September 18-20

Available on Infoscience
October 26, 2005
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/218417
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