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research article
Conductive SU8 Photoresist for Microfabrication
A conductive composite photoresist has been developed for the direct photopatterning of electrodes. It is based on a dispersion of silver nanoparticles in SU8, a non-conductive, negative-tone photoresist. Manufactured structures have an electrical conductivity at a low silver content of around 6 vol.-%
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Jiguet'05-AdvFunctMat.pdf
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