Conductive SU8 Photoresist for Microfabrication

A conductive composite photoresist has been developed for the direct photopatterning of electrodes. It is based on a dispersion of silver nanoparticles in SU8, a non-conductive, negative-tone photoresist. Manufactured structures have an electrical conductivity at a low silver content of around 6 vol.-%


Published in:
Advanced Functional Materials, 15, 1511-1516
Year:
2005
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Note: The status of this file is: EPFL only


 Record created 2005-09-21, last modified 2018-03-17

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