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  4. 2-D Materials for Ultrascaled Field-Effect Transistors: One Hundred Candidates under the Ab Initio Microscope
 
research article

2-D Materials for Ultrascaled Field-Effect Transistors: One Hundred Candidates under the Ab Initio Microscope

Klinkert, Cedric
•
Szabo, Aron
•
Stieger, Christian
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July 28, 2020
Acs Nano

Due to their remarkable properties, single-layer 2-D materials appear as excellent candidates to extend Moore's scaling law beyond the currently manufactured silicon FinFETs. However, the known 2-D semiconducting components, essentially transition metal dichalcogenides, are still far from delivering the expected performance. Based on a recent theoretical study that predicts the existence of more than 1800 exfoliable 2-D materials, we investigate here the 100 most promising contenders for logic applications. Their current versus voltage characteristics are simulated from first-principles, combining density functional theory and advanced quantum transport calculations. Both n- and p-type configurations are considered, with gate lengths ranging from 15 down to 5 nm. From this large collection of electronic materials, we identify 13 compounds with electron and hole currents potentially much higher than those in future Si FinFETs. The resulting database widely expands the design space of 2-D transistors and provides original guidelines to the materials and device engineering community.

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Type
research article
DOI
10.1021/acsnano.0c02983
Web of Science ID

WOS:000557762800081

Author(s)
Klinkert, Cedric
Szabo, Aron
Stieger, Christian
Campi, Davide  
Marzari, Nicola  
Luisier, Mathieu
Date Issued

2020-07-28

Publisher

AMER CHEMICAL SOC

Published in
Acs Nano
Volume

14

Issue

7

Start page

8605

End page

8615

Subjects

Chemistry, Multidisciplinary

•

Chemistry, Physical

•

Nanoscience & Nanotechnology

•

Materials Science, Multidisciplinary

•

Chemistry

•

Science & Technology - Other Topics

•

Materials Science

•

2-d materials

•

ab initio device simulation

•

next-generation field-effect transistors

•

performance comparison

•

materials and device parameters

•

high-electron-mobility

•

layer

•

transport

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
THEOS  
Available on Infoscience
September 12, 2020
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/171620
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